上海口腔医学 ›› 2019, Vol. 28 ›› Issue (2): 136-140.doi: 10.19439/j.sjos.2019.02.006

• 论著 • 上一篇    下一篇

5种不同去牙面正畸残余粘接剂方法比较

钮晔, 安贝尔, 敬怡, 张泽宇, 肖立伟   

  1. 中南大学 湘雅二医院,湖南 长沙 410000
  • 收稿日期:2018-07-13 修回日期:2018-09-19 出版日期:2019-04-25 发布日期:2019-06-20
  • 通讯作者: 肖立伟,E-mail:Xiao_lw@csu.edu.cn
  • 作者简介:钮晔(1994-),女,学士,E-mail:newyear2030@163.com

Comparisons of five different resin-removal methods on enamel surface

NIU Ye, Ahmad Ghiaz Hussien Anbar, JIN Yi, ZHANG Ze-yu, XIAO Li-wei   

  1. The Second Xiangya Hospital of Central South University. Changsha 410000, Hunan Province, China
  • Received:2018-07-13 Revised:2018-09-19 Online:2019-04-25 Published:2019-06-20

摘要: 目的 通过比较5种方法去除牙面残余正畸粘接剂对牙面的影响及操作所用时间,为筛选最佳去牙面粘接树脂方法提供参考。方法 选用正畸治疗需要拔除的健康前磨牙40颗,按不同的去牙面粘接剂方法随机分为5组,每组8颗。在常规粘接托接槽并去粘接后,分别用碳化钨钻(A组)、碳化钨钻+矽粒子(B组)、金刚砂钻(C组)、金刚砂钻+矽粒子(D组)、矽粒子(E组)做牙面处理,记录各组操作时间(T),并在扫描电镜(SEM)下观察、照相,记录釉质损伤指数(enamel damage index)。采用SPSS20.0软件包对操作时间T及EDI分别进行单因素方差分析及非参数秩变换分析。结果 各组EDI排序为C组>D组>A组>B组>E组,差异具有统计学意义(P<0.05)。各组操作时间排序为E组>D组>B组>A组>C组,差异具有统计学意义(P<0.05)。结论 用高速碳化钨钻加矽粒子去除残余粘接剂对釉质损伤较小且操作时间合理,值得临床推荐。

关键词: 去粘接, 矽粒子, 釉质损伤指数, 扫描电镜

Abstract: PURPOSE: To compare enamel surface state and operating time following debonding by using 5 different resin removal methods. METHODS: Forty healthy human premolars extracted for orthodontic purpose were selected and then divided into 5 groups randomly based on different resin-removal methods, 8 in each group. After regular bonding brackets and debonding, tungsten carbide bur (group A), tungsten carbide bur+silicon particles(group B), corundum bur(group C), corundum bur+silicon particles (group D) and silicon particles (group E) were used respectively to deal with the enamel surfaces. The operating time(T) of each group was recorded. The samples were observed under scanning electron microscope (SEM), and enamel damage index(EDI) was recorded. The scores of EDI were analysed using SPSS 20.0 software package . RESULTS: The order of EDI was group C>group D>group A >group B>group E, significant difference was found between 5 groups (P<0.05). The order of operating time was group E>group D>group B>group A>group C, significant difference was found between 5 groups (P<0.05). CONCLUSIONS: Using tungsten carbide bur followed by silicon particles to remove residual resin on enamel surface causes less damage to the enamel surface, and requires reasonable time.

Key words: Debonding, Silicon particles, EDI, SEM

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